Texas Instruments DLP® LightCrafter™ 4500 DLPLCR4500EVM DLPLCR4500EVM Datenbogen
Produktcode
DLPLCR4500EVM
DLPS028A – APRIL 2013 – REVISED MAY 2013
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Input illumination optical axis oriented at 24° relative to the window normal
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Projection optical axis oriented at 0° relative to the window normal
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f/3 illumination aperture
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f/2.4 projection aperture
Based on these use conditions, the nominal DMD optical efficiency results from the following four components:
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Micromirror array fill factor: nominally 92.5%
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Micromirror array diffraction efficiency: nominally 86%
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Micromirror surface reflectivity: nominally 88%
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Window transmission: nominally 97% (single pass, through two surface transitions)
(15) Does not account for the effect of micromirror switching duty cycle, which is application dependant. Micromirror switching duty cycle
represents the percentage of time that the micromirror is actually reflecting light from the optical illumination path to the optical projection
path. This duty cycle depends on the illumination aperture size, the projection aperture size, and the micromirror array update rate.
path. This duty cycle depends on the illumination aperture size, the projection aperture size, and the micromirror array update rate.
(16) See the Package Mechanical Characteristics for details regarding the size and location of the window aperture.
(17) The active area of the DLP4500 is surrounded by an aperture on the inside of the DMD window surface that masks structures of the
DMD device assembly from normal view. The aperture is sized to anticipate several optical conditions. Overfill light illuminating the area
outside the active array can create artifacts from the mechanical features that surround the active array and other surface anomalies
that may be visible on the projected image. The illumination optical system should be designed to limit light flux incident anywhere
outside the active array less than 10% of the average flux level in the active area. Depending on the particular system's optical
architecture and assembly tolerances, the amount of overfill light on the outside of the active array may cause visible artifacts.
outside the active array can create artifacts from the mechanical features that surround the active array and other surface anomalies
that may be visible on the projected image. The illumination optical system should be designed to limit light flux incident anywhere
outside the active array less than 10% of the average flux level in the active area. Depending on the particular system's optical
architecture and assembly tolerances, the amount of overfill light on the outside of the active array may cause visible artifacts.
Copyright © 2013, Texas Instruments Incorporated
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