Canon FPA-5520iV Stepper Guia De Especificação
Model Type
i-Line (365 nm) Stepper
Wafer Size
300 mm
Resolution
≤ 1.0 µm
Reticle Size
6 in. (0.25 in. thick)
Reduction Ratio
2:1
Field Size
52 mm x 34 mm
Overlay Accuracy
≤ 150 nm (|m| + 3σ)
Footprint (W x D x H)
2,300 mm × 3,340 mm × 2,700 mm
Options
Through-Silicon Alignment System (TSA Scope)
Wafer Edge Exposure (WEE)
Wafer Edge Shielding (WES)
EFEM
Pellicle Particle Checker
Illumination Purge Unit
Chemical Filtering
Resist Outgassing Unit
PC Remote Console
Online Functions (GEM2, GEM0304)
FPA-5520iV Stepper
Product Specifications
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Main Unit Spec